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Lamp Annealing Equipment - List of Manufacturers, Suppliers, Companies and Products

Lamp Annealing Equipment Product List

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Flash Lamp Annealing Device FLA

Flash Lamp Annealing Device FLA

Various materials such as semiconductors! Annealing is possible in ultra-short times ranging from a few milliseconds to several hundred milliseconds.

The Flash Lamp Annealing device, FLA, is a standalone unit designed for DTF-FLA ultra-short time annealing. It is capable of ultra-short annealing times ranging from a few milliseconds to several hundred milliseconds for semiconductor materials and other materials. The very short pulses (micro/millisecond level) from the xenon flash lamp heat only the surface at an ultra-fast heating rate, making it a compact research and development device suitable for applications such as annealing films on flexible substrates and substrates with low heat resistance. It is compact, user-friendly, and ideal for research and development in various applications. For more details, please contact us or refer to the catalog.

  • Annealing furnace

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Contact annealing lamp annealing device "RLA-3100-V"

Contact annealing lamp annealing device "RLA-3100-V"

Processing of GaN substrates is also possible! Introduction of contact annealing lamp annealing (RTP) equipment.

The "RLA-3100-V" is a contact annealing lamp annealing (RTP) device that can accommodate a wide range of wafer sizes up to 6 inches. It features a vacuum-designed quartz tube that allows for a clean vacuum (LP) environment and processing in an N2 load lock atmosphere. Additionally, it is equipped with an automatic wafer exchange mechanism, enabling C to C transport. 【Features】 ■ Supports a wide range of wafer sizes up to 6 inches ■ Equipped with an automatic wafer exchange mechanism for C to C transport ■ Improved annealing characteristics due to vacuum compatibility ■ Achieves short TAT with N2 load lock compatibility ■ Capable of processing GaN substrates *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductor manufacturing equipment

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Flash Lamp Annealing Device "SUS980 Series"

Flash Lamp Annealing Device "SUS980 Series"

Depending on the work size, multiple flash lamps can be arranged! Large area simultaneous irradiation and high-intensity irradiation are possible!

The "SUS980 Series" is a flash lamp annealing device that can be used for applications such as crystallization, peeling, and oxide film formation. By controlling the current flowing through the lamp with a semiconductor switch to turn it ON/OFF, the pulse width of the lamp current can be adjusted, allowing for control of the heating depth (0.1 to 60 msec). Depending on the work size, multiple flash lamps can be arranged for large area irradiation, enabling high irradiation. 【Features】 ■ Depth control (pulse control) ■ ON/OFF control of the current flowing through the lamp using a semiconductor switch ■ Adjustable lamp current pulse width for controlling heating depth (0.1 to 60 msec) ■ Multiple pulse irradiation is also possible ■ High output and large area processing (shortened tact time, high uniformity) *For more details, please refer to the PDF document or feel free to contact us.

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  • Heating device

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